INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR ESTIMATING LINE EDGE VARIABILITY AND OPTIMIZING WAFER PRINTING USING POWER SPECTRAL DENSITY"

GENEVA, Sept. 21 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/053479) for "SYSTEMS AND METHODS FOR ESTIMATING LINE EDGE VARIABILITY AND OPTIMIZING WAFER PRINTING USING POWER SPECTRAL DENSITY" on Feb 10, 2025. With publication no. WO/2025/190577, the details related to the patent application was published on Sep 18, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KOOIMAN, Marleen (P.O. Box 3245500 AH Veldhoven), VAN BREE, Joost (P.O. Box 3245500 AH Veldhoven), MAAS, Ruben, Cornelis (P.O. Box 3245500 AH Veldhoven)

Abstract: Systems and meth...