INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR DISTORTION CORRECTION IN CHARGED-PARTICLE BEAM IMAGING"

GENEVA, April 19 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/075705) for "SYSTEMS AND METHODS FOR DISTORTION CORRECTION IN CHARGED-PARTICLE BEAM IMAGING" on Sep 13, 2024. With publication no. WO/2025/078106, the details related to the patent application was published on Apr 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HUANG, Zhuangxiong (P.O. Box 3245500 AH Veldhoven), REN, Yan (P.O. Box 3245500 AH Veldhoven), YU, Dongchi (80 W Tasman DriveSan Jose, California 95134)

Abstract: Systems and methods of reducing SEM image distortion u...