INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEM AND METHOD FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS SUCH AS CLAMP RETICLE CONTACT AREAS"

GENEVA, Feb. 3 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/068744) for "SYSTEM AND METHOD FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS SUCH AS CLAMP RETICLE CONTACT AREAS" on Jul 03, 2024. With publication no. WO/2025/021450, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JOCHEMSEN, Marinus (P.O. Box 3245500 AH Veldhoven), MARKS, Michiel, Franciscus, Monica (P.O. Box 3245500 AH Veldhoven)

Abstract: System for in-situ cleaning of a clamp of a lithography apparatu...