INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SUPPRESSION OF PLASMA-INDUCED SURFACE DEGRADATION BY IRRADIATION OF LIGHT"

GENEVA, Dec. 15 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/061408) for "SUPPRESSION OF PLASMA-INDUCED SURFACE DEGRADATION BY IRRADIATION OF LIGHT" on Apr 25, 2025. With publication no. WO/2025/252350, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN DE KERKHOF, Marcus, Adrianus (P.O. Box 3245500 AH Veldhoven)

Abstract: An exposure apparatus comprising: an enclosure defining an environment, wherein the enclosure is configured to receive a main radiation from a main r...