GENEVA, Oct. 4 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/054997) for "SUBSTRATE AND METHOD FOR A HIGH POWER LASER SYSTEM" on Feb 25, 2025. With publication no. WO/2025/201772, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): VAN ZWOL, Adriaan, Roelof (P.O. Box 3245500 AH Veldhoven)
Abstract: The present disclosure provides a laser system comprising: a transport system arranged to transport a laser beam along a beam path from an inlet to a target region, wherein the bea...