GENEVA, May 17 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/079839) for "SOURCE, ASSESSMENT APPARATUS, METHOD OF CLEANING A CHARGED PARTICLE SOURCE, METHOD OF CLEANING A COMPONENT OF AN ASSESSMENT APPARATUS" on Oct 22, 2024. With publication no. WO/2025/098766, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN SOEST, Jurgen (P.O. Box 3245500 AH Veldhoven)

Abstract: The present disclosure relates to a charged particle source and related apparatus and methods. In one a...