INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SCANNING DEFLECTOR DESIGN FOR A CHARGED PARTICLE BEAM APPARATUS"

GENEVA, Jan. 7 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/067987) for "SCANNING DEFLECTOR DESIGN FOR A CHARGED PARTICLE BEAM APPARATUS" on Jun 25, 2025. With publication no. WO/2026/003125, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Yongxin (80 W Tasman DriveSan Jose, California 95134)

Abstract: A system and method for operating an electron deflector in a scanning electron microscope comprises operating the electron deflector in two different modes of operat...