GENEVA, March 17 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/072622) for "RETICLE HANDLING SYSTEM" on Aug 09, 2024. With publication no. WO/2025/051492, the details related to the patent application was published on Mar 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): VAN DONGEN, Paul (77 Danbury RoadWilton, Connecticut 06897), VAN DER HOEVEN, Carsten, Maarten (P.O. Box 3245500 AH Veldhoven)
Abstract:
Multiple cover store positions are provided within an in-vacuum reticle library area of a lithographic apparatus. A system for handling...