INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "PROCESS MODEL BASED SCANNING ELECTRON MICROSCOPY (SEM) IMAGE DISTORTION CORRECTION"

GENEVA, Feb. 24 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/069759) for "PROCESS MODEL BASED SCANNING ELECTRON MICROSCOPY (SEM) IMAGE DISTORTION CORRECTION" on Jul 11, 2024. With publication no. WO/2025/036631, the details related to the patent application was published on Feb 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FAN, Yongfa (80 W Tasman Dr.San Jose, California 95134), REN, Jiaxing (80 W Tasman Dr.San Jose, California 95134), CHEN, Yi-Yin (80 W Tasman Dr.San Jose, California 95134), YAN, Tianyu (80 W Tasman Dr.San Jose, Calif...