INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "POST-OPTICAL PROXIMITY CORRECTION MASK LAYOUT CORRECTION FOR WAFER BACK SIDE OVERLAY"

GENEVA, Feb. 16 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/070145) for "POST-OPTICAL PROXIMITY CORRECTION MASK LAYOUT CORRECTION FOR WAFER BACK SIDE OVERLAY" on Jul 14, 2025. With publication no. WO/2026/032616, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ZHANG, Huaichen (P.O. Box 3245500 AH Veldhoven), HSU, Chia-Hao (P.O. Box 3245500 AH Veldhoven), TABERY, Cyrus, Emil (80 W Tasman DriveSan Jose, California 95134), WAGNER, Christian (P.O. Box 3245500 AH Veldhoven), ...