INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "PHOTOLITHOGRAPHY OBJECT STAGE AND METHOD FOR FORMING THE SAME"

GENEVA, Feb. 16 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/069760) for "PHOTOLITHOGRAPHY OBJECT STAGE AND METHOD FOR FORMING THE SAME" on Jul 11, 2024. With publication no. WO/2025/031724, the details related to the patent application was published on Feb 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WEICHSELBAUM, Stefan (P.O. Box 3245500 AH Veldhoven)

Abstract: An object stage and method thereof having reduced mass for use in photolithography and comprises a support surface that is configured to support an object, a fin network c...