GENEVA, Oct. 4 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/056585) for "PATTERNING DEVICE VOLTAGE BIASING SYSTEM" on Mar 11, 2025. With publication no. WO/2025/201867, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): CATS, Selwyn, Yannick, Frithjof (P.O. Box 3245500 AH Veldhoven), VAN DER WILK, Ronald (P.O. Box 3245500 AH Veldhoven), LIU, Bo (P.O. Box 3245500 AH Veldhoven)
Abstract: A patterning device support system for use in a lithographic apparatus comprising: a patt...