INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "OVERLAY METROLOGY WITH ENHANCED OVERLAY TARGETS"

GENEVA, Feb. 23 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/070753) for "OVERLAY METROLOGY WITH ENHANCED OVERLAY TARGETS" on Jul 18, 2025. With publication no. WO/2026/037590, the details related to the patent application was published on Feb 19, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BUIJS, Robin, Daniel (P.O. Box 3245500 AH Veldhoven), REZVANI NARAGHI, Roxana (77 Danbury RoadWilton, Connecticut 06897)

Abstract: Measuring overlay using enhanced overlay targets is described. Multiple dimensional (e.g., x and y components) of an ov...