INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "OVERLAY AND ALIGNMENT METROLOGY SYSTEMS AND METHODS FOR SEMICONDUCTOR MANUFACTURING"

GENEVA, Jan. 27 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/067365) for "OVERLAY AND ALIGNMENT METROLOGY SYSTEMS AND METHODS FOR SEMICONDUCTOR MANUFACTURING" on Jun 20, 2024. With publication no. WO/2025/016658, the details related to the patent application was published on Jan 23, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): COENE, Willem, Marie, Julia, Marcel (P.O. Box 3245500 AH Veldhoven), GOORDEN, Sebastianus, Adrianus (P.O. Box 3245500 AH Veldhoven), TARABRIN, Sergey (P.O. Box 3245500 AH Veldhoven)

Abstract: Measuring overlay an...