INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "MULTIPLE PITCH SEM OVERLAY MARKS AND ALGORITHM FOR STITCHING AREA"

GENEVA, March 9 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/071761) for "MULTIPLE PITCH SEM OVERLAY MARKS AND ALGORITHM FOR STITCHING AREA" on Jul 31, 2024. With publication no. WO/2025/045496, the details related to the patent application was published on Mar 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FU, Jiyou (80 W Tasman Dr.San Jose, California 95134-1720)

Abstract: Improved systems and methods for determining stitching overlay and other metrology parameters in semiconductor manufacturing are disclosed. The systems and metho...