INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "MONITORING FADING EFFECT BASED ON COMPUTATIONAL LITHOGRAPHY SIMULATION"

GENEVA, May 5 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/077408) for "MONITORING FADING EFFECT BASED ON COMPUTATIONAL LITHOGRAPHY SIMULATION" on Sep 30, 2024. With publication no. WO/2025/087650, the details related to the patent application was published on May 01, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PENG, Xingyue (80 W Tasman Dr.San Jose, California 95134), SHI, Zhan (80 W Tasman Dr.San Jose, California 95134), HOWELL, Rafael C. (80 W Tasman Dr.San Jose, California 95134)

Abstract: Described herein is a method and system f...