INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "METHOD OF MONITORING PROCESS DRIFT IN A SEMICONDUCTOR MANUFACTURING PROCESS"

GENEVA, June 30 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/082765) for "METHOD OF MONITORING PROCESS DRIFT IN A SEMICONDUCTOR MANUFACTURING PROCESS" on Nov 18, 2024. With publication no. WO/2025/131486, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SCHENKELAARS, Thijs (P.O. Box 3245500 AH Veldhoven)

Abstract: Described is a method of measuring at least one exposure offset error relating to a lithographic apparatus. The method comprises obtaining a substrate compris...