INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "METHOD OF CONTROLLING EXPOSURE APPARATUS"

GENEVA, Jan. 12 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/064810) for "METHOD OF CONTROLLING EXPOSURE APPARATUS" on May 28, 2025. With publication no. WO/2026/008218, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SUBRAMANIAN, Raaja Ganapathy (P.O. Box 3245500 AH Veldhoven), MOEST, Bearrach (P.O. Box 3245500 AH Veldhoven)

Abstract: Disclosed herein is a method of controlling an exposure apparatus configured to expose one or more substrates, the method comprising: det...