INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "METHOD AND SYSTEM FOR GENERATING AN OVERLAY-TOLERANT MASK PATTERN DESIGN"

GENEVA, Feb. 24 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/070060) for "METHOD AND SYSTEM FOR GENERATING AN OVERLAY-TOLERANT MASK PATTERN DESIGN" on Jul 15, 2024. With publication no. WO/2025/036637, the details related to the patent application was published on Feb 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SLACHTER, Abraham (P.O. Box 3245500 AH Veldhoven), VAN LARE, Marie-Claire (P.O. Box 3245500 AH Veldhoven), VAN INGEN SCHENAU, Koenraad (P.O. Box 3245500 AH Veldhoven), ENGBLOM, Peter, David (80 W Tasman DriveSan Jose, Californ...