INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "METHOD AND SYSTEM FOR DIFFRACTION PATTERN BASED SOURCE AND MASK OPTIMIZATION"

GENEVA, Feb. 16 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/070023) for "METHOD AND SYSTEM FOR DIFFRACTION PATTERN BASED SOURCE AND MASK OPTIMIZATION" on Jul 11, 2025. With publication no. WO/2026/032611, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HSU, Duan-Fu, Stephen (80 W Tasman DriveSan Jose, California 95134), JIANG, Xiaohui (P.O. Box 3245500 AH Veldhoven), SHI, Dongxiang (P.O. Box 3245500 AH Veldhoven), BASELMANS, Johannes, Jacobus, Matheus (P.O. Box 3245500 A...