INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "METHOD AND MEASUREMENT SYSTEM FOR DETERMINING DATA RELATING TO ABERRATIONS CAUSED BY A PROJECTION SYSTEM"

GENEVA, Nov. 10 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/059154) for "METHOD AND MEASUREMENT SYSTEM FOR DETERMINING DATA RELATING TO ABERRATIONS CAUSED BY A PROJECTION SYSTEM" on Apr 03, 2025. With publication no. WO/2025/228613, the details related to the patent application was published on Nov 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN KESSEL, Marcel, Theodorus, Maria (P.O. Box 3245500 AH Veldhoven)

Abstract: A method is provided of determining data relating to aberrations, the method comprising: providing a patterning de...