INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "MASK PATTERN OPTIMIZATION"

GENEVA, Feb. 16 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/069570) for "MASK PATTERN OPTIMIZATION" on Jul 10, 2024. With publication no. WO/2025/031711, the details related to the patent application was published on Feb 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KABIRI RAHANI, Ehsan (80 W Tasman Dr.San Jose, California 95134), PENG, Xingyue (80 W Tasman Dr.San Jose, California 95134)

Abstract: The present disclosure provides a computer implemented method for determining a mask pattern of a patterning device. The method comprise...