INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "MASK 3D (M3D) MODELING FOR LITHOGRAPHY SIMULATION"

GENEVA, Feb. 3 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/068037) for "MASK 3D (M3D) MODELING FOR LITHOGRAPHY SIMULATION" on Jun 26, 2024. With publication no. WO/2025/021417, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Qiugu (80 W Tasman DriveSan Jose, California 95134), LYU, Wen (80 W Tasman DriveSan Jose, California 95134), XIE, Xiaobo (80 W Tasman DriveSan Jose, California 95134), WANG, Jen-Shiang (80 W Tasman DriveSan Jose, California 95134), CHOU, Chih-S...