INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "LITHOGRAPHIC APPARATUS COMPRISING A REFLECTIVE MARK AND A TRANSMISSIVE MARK AND A METHOD OF MEASURING ABERRATIONS IN A LITHOGRAPHIC APPARATUS"

GENEVA, Dec. 22 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/062952) for "LITHOGRAPHIC APPARATUS COMPRISING A REFLECTIVE MARK AND A TRANSMISSIVE MARK AND A METHOD OF MEASURING ABERRATIONS IN A LITHOGRAPHIC APPARATUS" on May 13, 2025. With publication no. WO/2025/256840, the details related to the patent application was published on Dec 18, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DIKKEN, Dirk Jan, Willem (P.O. Box 3245500 AH Veldhoven), CHONG, Derick, Yun, Chek (P.O. Box 3245500 AH Veldhoven)

Abstract: The present disclosure relates ...