INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, DIGITAL HOLOGRAPHIC MICROSCOPY ALIGNMENT SENSOR AND METHOD THEREOF"

GENEVA, April 6 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/073972) for "LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, DIGITAL HOLOGRAPHIC MICROSCOPY ALIGNMENT SENSOR, AND METHOD THEREOF" on Aug 27, 2024. With publication no. WO/2025/067799, the details related to the patent application was published on Apr 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): GOORDEN, Sebastianus Adrianus (P.O. Box 3245500 AH Veldhoven), HUISMAN, Simon Reinald (P.O. Box 3245500 AH Veldhoven), DEN BOEF, Arie Jeffrey (P.O. Box 3245500 AH Veldhoven), KONIJNENBERG,...