INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "INTERNAL LIGHT SOURCE, LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS AND METHOD THEREOF"

GENEVA, July 8 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/084748) for "INTERNAL LIGHT SOURCE, LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHOD THEREOF" on Dec 04, 2024. With publication no. WO/2025/140833, the details related to the patent application was published on Jul 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PAWLOWSKI, Michal, Emanuel (77 Danbury RoadWilton, Connecticut 06897), HUANG, Chien, Jung (P.O. Box 3245500 AH Veldhoven), RAUB, Akram (77 Danbury RoadWilton, Connecticut 06897), RAUB, Alexander, Kenneth (77 Danbury...