INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "INTERFEROMETER SYSTEM AND LITHOGRAPHIC APPARATUS"

GENEVA, Sept. 1 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/052333) for "INTERFEROMETER SYSTEM AND LITHOGRAPHIC APPARATUS" on Jan 30, 2025. With publication no. WO/2025/176431, the details related to the patent application was published on Aug 28, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KLAVER, Renatus, Gerardus (P.O. Box 3245500 AH Veldhoven)

Abstract: An interferometer system comprises: - first and second splitters to split first and second beams received from first and second input terminals in first measurement and reference ...