GENEVA, March 9 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/071995) for "INSPECTION APPARATUS, WEDGE SYSTEM FOR REDUCING ABERRATIONS, AND METHOD OF FABRICATION THEREOF" on Aug 02, 2024. With publication no. WO/2025/045510, the details related to the patent application was published on Mar 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YANG, Tzu-Yi (77 Danbury RoadWilton, Connecticut 06897)

Abstract: A method of reducing optical aberrations in an optical system includes determining an aberration induced by the optical system. The det...