INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "IMAGE BASED METROLOGY BASED ON LOCAL SIGNAL STRENGTH FOR DISTORTED DIFFRACTED RADIATION"

GENEVA, Oct. 4 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/053342) for "IMAGE BASED METROLOGY BASED ON LOCAL SIGNAL STRENGTH FOR DISTORTED DIFFRACTED RADIATION" on Feb 07, 2025. With publication no. WO/2025/201719, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HUISMAN, Simon Reinald (P.O. Box 3245500 AH Veldhoven)

Abstract: In a semiconductor structure, metrology marks may be covered by non-planar layers, such as resist layers. A resist layer may have tilted or dished...