INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "FOCUS METROLOGY METHOD AND METHOD FOR DESIGNING A FOCUS TARGET FOR FOCUS METROLOGY"

GENEVA, May 17 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/078539) for "FOCUS METROLOGY METHOD AND METHOD FOR DESIGNING A FOCUS TARGET FOR FOCUS METROLOGY" on Oct 10, 2024. With publication no. WO/2025/098704, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria (PO Box 3245500 AH Veldhoven), VAN DEN BOS, Karel, Hendrik, Wouter (PO Box 3245500 AH Veldhoven), HOU, Zhe (PO Box 3245500 AH Veldhoven), LEMMERS, Dorus (PO Box 3245500...