INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "EXPOSURE APPARATUS AND METHOD WITH REDUCTION OF AN OVERLAY ERROR"

GENEVA, Aug. 4 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/051078) for "EXPOSURE APPARATUS AND METHOD WITH REDUCTION OF AN OVERLAY ERROR" on Jan 16, 2025. With publication no. WO/2025/157684, the details related to the patent application was published on Jul 31, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BOSCHKER, Stijn, Gerardus, Antonius (P.O. Box 3245500 AH Veldhoven), MALAGODI CALIARI, Ricardo (P.O. Box 3245500 AH Veldhoven), BOEIJE, Joshua, Ruben (P.O. Box 3245500 AH Veldhoven), JANSEN, Bas (P.O. Box 3245500 AH Veldhoven), TEMIZ, ...