GENEVA, April 19 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/077595) for "ELECTRON-BEAM IMAGING SYSTEM" on Oct 01, 2024. With publication no. WO/2025/078213, the details related to the patent application was published on Apr 17, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): WIELAND, Marco, Jan-Jaco (P.O. Box 3245500 AH Veldhoven)
Abstract:
The present invention provides an electron-beam imaging system comprising an electron-beam source for generating a primary beam, an optical system for directing and focusing the primary beam onto a s...