INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "DIRECTLY ACTUATED PATTERNING DEVICE FOR A LITHOGRAPHY APPARATUS"

GENEVA, July 29 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/086755) for "DIRECTLY ACTUATED PATTERNING DEVICE FOR A LITHOGRAPHY APPARATUS" on Dec 17, 2024. With publication no. WO/2025/153282, the details related to the patent application was published on Jul 24, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MOLITERNO, Matthew, Stephen, Beaton (77 Danbury RoadWilton, Connecticut 06897), ZORDAN, Enrico (77 Danbury RoadWilton, Connecticut 06897)

Abstract: Existing lithography apparatuses use a reticle clamp to hold a reticle, and a chuck ...