GENEVA, Nov. 10 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/059804) for "DIGITAL HOLOGRAPHY SYSTEM AND METHOD FOR DIFFRACTION BASED ALIGNMENT" on Apr 09, 2025. With publication no. WO/2025/228647, the details related to the patent application was published on Nov 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): PATEL, Aabid (77 Danbury RoadWilton, Connecticut 06897), SHOME, Krishanu (77 Danbury RoadWilton, Connecticut 06897), SONDE, Aniruddha Ramakrishna (77 Danbury RoadWilton, Connecticut 06897), VAN BRUGGEN, Olaf, Hubertus, Wilhelmus (...