INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "DESIGN AWARE DYNAMIC PIXEL SIZES TO BOOST SCANNING ELECTRON MICROSCOPY INSPECTION AND METROLOGY THROUGHPUT"

GENEVA, May 17 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/079862) for "DESIGN AWARE DYNAMIC PIXEL SIZES TO BOOST SCANNING ELECTRON MICROSCOPY INSPECTION AND METROLOGY THROUGHPUT" on Oct 22, 2024. With publication no. WO/2025/098768, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Fuming (80 W Tasman DriveSan Jose, California 95134)

Abstract: A method for improving throughput for a charged-particle beam apparatus, and more particularly, a method of improving ima...