INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "CONTROL OF LASER OF EUV SOURCE OF A LITHOGRAPHIC APPARATUS"

GENEVA, June 30 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/083364) for "CONTROL OF LASER OF EUV SOURCE OF A LITHOGRAPHIC APPARATUS" on Nov 23, 2024. With publication no. WO/2025/131549, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WARNAAR, Bastiaan (P.O. Box 3245500 AH Veldhoven), BOERMAN, Willem (P.O. Box 3245500 AH Veldhoven)

Abstract: Disclosed herein is a lithographic apparatus comprising: an EUV source that comprises a laser; and a control system; wherein: th...