INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "APPARATUS AND PROCESS FOR REDUCED DEPOSITION IN LIGHT SOURCE"

GENEVA, June 30 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/081782) for "APPARATUS AND PROCESS FOR REDUCED DEPOSITION IN LIGHT SOURCE" on Nov 08, 2024. With publication no. WO/2025/131421, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FRENZEL, Alex, James (17075 Thornmint CourtSan Diego, California 92127), BRAAKSMA, Niels (17075 Thornmint CourtSan Diego, California 92127), STEWART IV, John, Tom (17075 Thornmint CourtSan Diego, California 92127), MANDRUSIAK, Gary, Dwayn...