GENEVA, April 19 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/075580) for "ABERRATION CORRECTION IN A METROLOGY SYSTEM" on Sep 12, 2024. With publication no. WO/2025/078101, the details related to the patent application was published on Apr 17, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): JAHANI, Saman (77 Danbury RoadWilton, Connecticut 06897), BASIRI, Ali (77 Danbury RoadWilton, Connecticut 06897), REZVANI NARAGHI, Roxana (77 Danbury RoadWilton, Connecticut 06897)
Abstract:
Metrology systems and methods are described. In these system...