INTERNATIONAL PATENT: ASML NETHERLANDS B.V., TECHNISCHE UNIVERSITEIT EINDHOVEN FILES APPLICATION FOR "DEFECT DETECTION FROM A SCANNING ELECTRON MICROSCOPE DERIVED DEPTH MAP WITH NEURAL NETWORK AND DEFECT STRENGTH THRESHOLDING"

GENEVA, April 14 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven), TECHNISCHE UNIVERSITEIT EINDHOVEN (Groene Loper 35612 AE Eindhoven) filed a patent application (PCT/EP2024/077391) for "DEFECT DETECTION FROM A SCANNING ELECTRON MICROSCOPE DERIVED DEPTH MAP WITH NEURAL NETWORK AND DEFECT STRENGTH THRESHOLDING" on Sep 27, 2024. With publication no. WO/2025/073610, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HOUBEN, Tim (P.O. Box 3245500 AH Veldhoven), WALLOW, Thomas I. (80 W Tasman DriveSan Jose, California 951...