INTERNATIONAL PATENT: ARRAYED MATERIALS (CHINA) CO., LTD. FILES APPLICATION FOR "INDUCTIVELY-COUPLED PLASMA (ICP) SOURCE FOR RECTANGULAR SUBSTRATE"

GENEVA, Sept. 7 -- ARRAYED MATERIALS (CHINA) CO., LTD. (1/F and 2/F, 101, Building 6, Longwu Industrial Zone, Shangfen Community, Minzhi Street, Longhua DistrictShenzhen, Guangdong 518131) filed a patent application (PCT/CN2024/079043) for "INDUCTIVELY-COUPLED PLASMA (ICP) SOURCE FOR RECTANGULAR SUBSTRATE" on Feb 28, 2024. With publication no. WO/2025/179485, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SAVAS, Stephen E. (7922 Winged Foot CourtPleasanton, CA 94588), YANG, Hong Sheng (1/F and 2/F, 101, Building 6, Longw...