INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "TRENCH AND CHANNEL GAP FILL TUNING FOR FLOWABLE CHEMICAL VAPOR DEPOSITION (FCVD) FILMS"

GENEVA, Aug. 19 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, CA 95054) filed a patent application (PCT/US2025/011443) for "TRENCH AND CHANNEL GAP FILL TUNING FOR FLOWABLE CHEMICAL VAPOR DEPOSITION (FCVD) FILMS" on Jan 13, 2025. With publication no. WO/2025/170714, the details related to the patent application was published on Aug 14, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MODI, Purvam (545 Oakmead Pkwy.Sunnyvale, CA 94085), CITLA, Bhargav (3050 Bowers AvenueSanta Clara, CA 95054), NEMANI, Srinivas (19859 Glen Brae DriveSaratoga, CA 95070), YIEH, Ellie (5888 Pistoia Way...