INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "SUBSTRATE FOR SEMICONDUCTOR FABRICATION HAVING SELECTIVELY TREATED PERIMETER AND METHOD OF TREATING"

GENEVA, Jan. 13 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/031167) for "SUBSTRATE FOR SEMICONDUCTOR FABRICATION HAVING SELECTIVELY TREATED PERIMETER AND METHOD OF TREATING" on May 28, 2025. With publication no. WO/2026/010689, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CONSTANTIN, Loic Benoit Vincent Robert Jean-Claude (9700 US HWY 290 EastEast Austin, Texas 78724), WOZNY, Sarah (9700 US HWY 290 EastAustin, Texas 78724)

Abstract: A substrate fo...