INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "STRUCTURE AND TECHNIQUE OF PHOTO-DEFINED SEMICONDUCTOR DEVICE WITH SELECTIVE DIELECTRIC CONSTANT REDUCTION"

GENEVA, April 16 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/044043) for "STRUCTURE AND TECHNIQUE OF PHOTO-DEFINED SEMICONDUCTOR DEVICE WITH SELECTIVE DIELECTRIC CONSTANT REDUCTION" on Aug 27, 2024. With publication no. WO/2025/075726, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BRIGGS, Benjamin D. (3050 Bowers AvenueSanta Clara, California 95054)

Abstract: A semiconductor device may include a substrate. The semiconductor device may also includ...