INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "SOURCE-DRAIN ISOLATION FOR COMPLEMENTARY FIELD EFFECT TRANSISTORS"

GENEVA, Oct. 6 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/021089) for "SOURCE-DRAIN ISOLATION FOR COMPLEMENTARY FIELD EFFECT TRANSISTORS" on Mar 24, 2025. With publication no. WO/2025/207479, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): COSTRINI, Gregory (3050 Bowers AvenueSanta Clara, California 95054), YEONG, Sai Hooi (3050 Bowers AvenueSanta Clara, California 95054), PAL, Ashish (Building 50, 3325 Scott Blvd.Santa Clara, California 95054), BAZI...