INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "SELECTIVE SILICON NITRIDE WITH TREATMENT FOR CONTACT FORMATION IN LOGIC OR MEMORY DEVICES"

GENEVA, June 12 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/057229) for "SELECTIVE SILICON NITRIDE WITH TREATMENT FOR CONTACT FORMATION IN LOGIC OR MEMORY DEVICES" on Nov 25, 2024. With publication no. WO/2025/117410, the details related to the patent application was published on Jun 05, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YOSHIDA, Naomi (3050 Bowers AvenueSanta Clara, California 95054), PRANATHARTHIHARAN, Balasubramanian (3050 Bowers AvenueSanta Clara, California 95054), CHEN, Hsueh Chung (Applied Materials,...