INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING"

GENEVA, April 17 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/049830) for "SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING" on Oct 03, 2024. With publication no. WO/2025/076247, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SHERPA, Sonam Dorje (3050 Bowers AvenueSANTA CLARA, California 95054), ABDULLA AL GALIB, Mir (3050 Bowers AvenueSANTA CLARA, California 95054), RANJAN, Alok (3050 Bowers AvenueSANTA CLARA, California 95054), TAKESHITA, Kenji ...