INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "SELECTIVE ETCHING OF SILICON-AND-GERMANIUM-CONTAINING MATERIALS WITH REDUCED UNDER LAYER LOSS"

GENEVA, Aug. 26 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/012558) for "SELECTIVE ETCHING OF SILICON-AND-GERMANIUM-CONTAINING MATERIALS WITH REDUCED UNDER LAYER LOSS" on Jan 22, 2025. With publication no. WO/2025/174546, the details related to the patent application was published on Aug 21, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HUANG, Jiayin (3050 Bowers AvenueSanta Clara, California 95054), LI, Zihui (3050 Bowers AvenueSanta Clara, California 95054), WANG, Anchuan (3050 Bowers AvenueSanta Clara, California 95...