INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "REDUCED UNDERLAYER OXIDATION DURING GAP FILL"

GENEVA, Jan. 13 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/035586) for "REDUCED UNDERLAYER OXIDATION DURING GAP FILL" on Jun 27, 2025. With publication no. WO/2026/010811, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DHAWAN, Sukrant (3050 Bowers AvenueSanta Clara, California 95054), SOMAN, Bhaskar (3050 Bowers AvenueSanta Clara, California 95054), ROY, Susmit Singha (3050 Bowers AvenueSanta Clara, California 95054), GHOSH, Supriya (3050 Bowers Ave...