INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "PRECURSOR, GAS MIXTURE AND METHOD FOR DEPOSITING A LOW K DIELECTRIC FILM"

GENEVA, Oct. 20 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/023381) for "PRECURSOR, GAS MIXTURE, AND METHOD FOR DEPOSITING A LOW K DIELECTRIC FILM" on Apr 07, 2025. With publication no. WO/2025/217018, the details related to the patent application was published on Oct 16, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KALUTARAGE, Lakmal C. (c/o Applied Materials, Inc.Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), BAGBY, Lauren Mary (c/o Applied Materials, Inc.Law Dept., M/S 12693050 Bowers AvenueSa...