GENEVA, April 30 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/052109) for "PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS" on Oct 18, 2024. With publication no. WO/2025/085843, the details related to the patent application was published on Apr 24, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): PONNEKANTI, Hari (3050 Bowers AvenueSanta Clara, California 95054), MALIK, Irfan Arshad (3050 Bowers AvenueSanta Clara, California 95054)
Abstract:
A system includes a remote plasma source, a processing chamber com...